Dr. André Steiner

als eingeladener Referent (invited speaker)

auf der Photonex 2011 in Coventry (UK)

Im Folgenden finden sie eine Liste unserer Publikationen aus allen relevanten Themenbereichen.

Publikationen

L.Eckertová, A.Steiner   "The Information Depth of Different Kinds of Appearance Electron Spectroscopy", 8th Czechoslovak Spectroscopic Conference, 24.-28. June 1988 Ceske Budejovice

A.Steiner, K.Bewilogua   "The Initial Growth of Ionplated Amorphous Carbon Layers", 10th conference "High Vacuum, Thin Films, Interfaces" 10.-13. June 1989, Dresden

A.Steiner   "Auger Peak Shape Approximation of Graphite and Diamond from the Density of States", 1st Conference "Nanodispersive Thin Films", 11.-13. November 1991, Chemnitz

A.Steiner, U.Falke   "Extraction of True Auger line Shape of Graphite and Diamond from Experimental Data using Fast Fourier Transformation", Surface and Interface Analysis Vol.23 (1995) 789-793

P.Hammer, A.Steiner, R.Villa, P.N.Gibson, J.Haupt, W.Gissler   "Titanium Boron Nitrid Coatings of Very High Hardness", "International Conference on Metallurgical Coatings and Thin Films",

25-29 April 1994 San Diego and "Surface and Coating Technology" 68/69 (1994) 194

M.Elena, L.Guzman, L.Calliari, L.Moro, A.Steiner, A.Miotello, M.Bionelli, R.Capalletti, P.M.Ossi   "Synthesis and Structural Characterisation of Boron Nitrid Films", "International Conference on Metallurgical Coatings and Thin Films", 25-29 April 1994 San Diego (CA) USA and "Thin Solid Films" 253 (1994) 78

A.Steiner   "Determination of the sp3/sp2Ratio of Amorphous Carbon Layers by AES Using an Improved Factor Analysis Method", 8th International Conference on Quantitative Surface Analysis, Surrey U.K., 23-26 August 1994

T.P.Mollart, M.A.Baker, J.Haupt, A.Steiner, P.Hammer, W.Gissler,   "Nanostructured Titanium Boron Nitride Coatings of Very High Hardness", 4th International Conference on Plasma Surface Engeneering, Garmisch-Partenkirchen (Germany), 19th-23rd September 1994 and "Surface and Coating Technology" Vol. 74-75 (1995) 491

M.A.Baker, A.Steiner, J.Haupt, W.Gissler   "An AES/XPS Study of TiBN Thin Films", 41st American Vacuum Congress, Denver (Colorado) USA, 24th-28th October 1994 and J. Vac. Sci. Tecnol. A 13(3), 1633-1638 1995

B.Rother, A.Steiner, H.A. Jehn, W.Gissler,   “Depth-sensing indentation measurements with Vickers and Berkovich indentors“ Journal of Material Research Vol.13 No.8 (1998) 2071-76

D. Roth, J. Mai, A. Steiner, L. Eismann,Large Area PECVD Deposition of Si₃N₄ and organic Si-layers, Asien European Conference on Plasma and Surface Engineering, September 1999 Beijing

W. Soppe, B.G. Duijvelaar, S.A.E. Schiermeier A.W. Weeber, A.Steiner, F.M. Schuurmanns     "A High Through-put PECVD Reactor for deposition of Passivating SiN Layers", 16^th European Photovoltaic Conference and Exhibition, May 2000 Glasgow

A. Steiner, “Methods of Plasma Surface Engineering” & “CVD and PVD in modern Microelectronic Technology”, Summer School at the University of Surrey, June 2002 Guildford UK

A. Steiner, R. Boehme, L. Voelkel, D. Decker, H.-P. Sperlich, K. Reinhardt, L. Rebenklau, “Advanced processing concept for mass production of c-Si solar cells with passivated rear side and local rear contacts”, EU PVSEC September 2010   Valencia (Spain)

A, Steiner, H.-P. Sperlich, R. Böhme, M. Leonhardt, M. König, J. Hausmann, M Plettig, „Technology for PERC type Solar Cells with AlOx back side passivation on mc-Si and c-Si in pilot line production” , EU PVSEC   September 2011 Hamburg (Germany)

A. Steiner (invited speaker), “Reduced recombination velocity on a Si surface using AlOx as a passivation layer and its application in advanced solar cell technology”, Photonex October 2011, Coventry (UK)

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